ANNEALSYS
Annealsys manufactures Rapid Thermal Processing and Chemical Vapor Deposition systems for R&D and production.
RTP / RTPCVD systems with vacuum and high temperature up to 2000°C. Lamp furnaces with pulse annealing capability. Possibility to perform ALD processes in the RTP machines: Al2O3 and ZnO.
RTP Applications: implant annealing, contact annealing, oxidation, nitridation, selenization, CVD of graphene and h-BN.
DLI-CVD / DLI-ALD systems with direct liquid injection vaporizers for deposition using the widest range of organometallic precursors. Multi process capability 2-inch system: DLI-CVD, DLI-ALD and RTP inside the same chamber. Applications: multi-metallic oxides, metals, nitrides, 2D materials: TMDs, graphene, h-BN.
We can provide process service in our laboratory.
ANNEALSYS
139 rue des Walkyries
34000 Montpellier
France
Phone: +33 467 20 23 63
Fax: +33 467 20 26 89
Email: sales@annealsys.com